📋 GRC compliance for CMMC 2.0, CPCSC, CPA Canada, IIROC…SaaS discovery for data governanceFree enriched web chat widget🚀 Enriched remote support without your laptop

Patch & vulnerability status

PDF Studio 2024.0.1

Latest tracked version 2024.0.1. Release status, tracked CVEs, and automated cross-platform patching for PDF Studio.

PlatformLatest versionCVEs trackedLast checked
Windows2024.0.102024-12-06

Why keeping PDF Studio patched matters

Unpatched third-party applications are one of the most common ways attackers get in: 57% of breached MSP clients and 32% of ransomware cases trace back to a missing patch. Every PDF Studio release that fixes a security bug is public, so attackers see it too, and an out-of-date install becomes a documented way in. Tracking the installed version on every machine and closing the gap quickly is what turns a disclosed CVE into a non-event.

How Lavawall® patches PDF Studio

Lavawall® watches PDF Studio releases and CVEs continuously, ranks each update by risk, and deploys it across your whole fleet, Windows, macOS, and Linux, from a single agent, independently of your RMM. You get one place to see which machines are behind on PDF Studio, one policy to bring them current, and timestamped evidence for audits.

Frequently asked questions

What is the latest version of PDF Studio?
Lavawall tracks PDF Studio at version 2024.0.1 (last checked 2024-12-06). New releases are monitored continuously and can be deployed automatically across your fleet.
Does PDF Studio have known security vulnerabilities (CVEs)?
Lavawall continuously monitors PDF Studio for newly disclosed CVEs and remediates them automatically as they appear.
How do I patch PDF Studio automatically?
Deploy the Lavawall® agent and PDF Studio updates are applied automatically across Windows, macOS, and Linux, risk-ranked and reported, independently of your RMM.

Lavawall® monitors releases and CVEs for PDF Studio through public information and proprietary statistical analysis, and can patch it automatically across your fleet.